Surface modification of a Mo-substrate to form an oxidation-resistant MoSi2 layer using a Si-saturated tin bath

Molybdenum disilicide (MoSi 2 ) is one of the most heat and oxidation resistant materials used in high-temperature applications. In this work, feasibility forming an oxidation-resistant MoSi coating using a low-temperature Sn-Si bath by hot dipping method was evaluated. It found that smooth dense layer can be successfully synthesized on surface Mo-substrate at 700 °C to 1000 °C. Using method, more rapidly than conventional methods much low operating temperatures. The diffusion through product controlled growth formed layer, rate fastest 800 This due replacement larger tin atoms led expansion lattice, allowing faster silicon silicide towards unreacted Mo-substrate. Oxidation resistance test 1150 for h confirmed present protects from rapid elevated • A low-cost, low-temperature, siliconizing form Formation molybdenum substrate Provides rates temperatures below among existing